Company builds on large diameter silicon carbide (SiC) on silicon technology

Aachen/Germany, August 29, 2013 - AIXTRON SE today announced that Air Water Inc. of Azumino/Japan is reporting the successful installation of a fully automated AIX G5 HT Planetary Reactorin a 8x6-inch configuration for the growth of GaN epitaxial layers. 

Air Water selected the AIXTRON MOCVD system based on its ability to deliver superior material uniformity, a key factor in demonstrating the advantage of Air Water substrates for GaN epitaxy.

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