Inactive Instrument

SK Materials Co., Ltd. Stock price

Equities

A036490

KR7036490001

Commodity Chemicals

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SK Materials Co., Ltd. acquired Happy Companion Co., Ltd. CI
SK Materials Co., Ltd.(KOSDAQ:A036490) dropped from S&P Global BMI Index CI
SK Inc. Absorbs Advance Materials Subsidiary MT
Sk Materials Performance Co., Ltd. announced that it has received KRW 60.999994 billion in funding from SK Materials Co., Ltd. CI
SK Inc. completed the acquisition of 50.9% stake in SK Materials Co., Ltd.. CI
Sk Materials Performance Co., Ltd. announced that it expects to receive KRW 60.999994 billion in funding from SK Materials Co., Ltd. CI
BMW : Participates In Lilac Solutions' $150 Million Funding Round MT
BMW invests in lithium technology startup Lilac Solutions RE
SK Materials, Group 14 to Build $726 Milion Electric Vehicle Battery Material Factory in South Korea MT
SK Materials : Group14 partners with InoBat to make batteries for electric vehicles RE
SK Inc. agreed to acquire remaining 50.9% stake in SK Materials Co., Ltd. for KRW 1.4 trillion. CI
Group14 Technologies Announces Joint Venture with SK Materials to Accelerate Global Dual Sourcing for Lithium-Silicon Battery Materials CI
SK Materials JNC Co., Ltd. announced that it has received KRW 22.379 billion in funding from SK Materials Co., Ltd. CI
Group14 Technologies, Inc. announced that it has received $16.999999 million in funding from SK Materials Co., Ltd., OVP Venture Partners CI
Group14 Technologies, Inc. announced that it expects to receive $17.126 million in funding CI
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Managers TitleAgeSince
Chief Executive Officer 57 -
Director of Finance/CFO 54 -
Compliance Officer 51 17-06-19
Members of the board TitleAgeSince
Director/Board Member 60 17-03-23
Director/Board Member 59 16-02-15
Chief Executive Officer 57 -
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SK Materials Co Ltd, formerly OCI Materials Co Ltd, is a Korea-based company engaged in the manufacture and sale of special gas special gas and industrial gas. The Company is engaged in the manufacturing business of special gases used in the manufacturing process of semiconductors and display panels, and the industrial gas manufacturing business that produces oxygen, nitrogen, argon, and carbon dioxide gases. The Company mainly produces nitrogen trifluoride (NF3), which is injected to remove any residues on the internal walls of chemical vapor deposition (CVD) chamber; silane (SiH4), which is used to deposit silicon on wafer in semiconductors and to deposit silicon on TFT on top of glass substrates for TFT-LCD; tungsten hexafluoride (WF6), which makes contact plugs during CVD process, as well as dichlorosilane (DCS), which is silicon precursor gas used in combination with ammonia for SiH4 CVD and for deposition of epitaxial silicon.
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