Tokyo Electron : IBM and TEL NEXX Collaborate to Advance 3D Semiconductor Packaging
07/05/2012| 11:17pm US/Eastern

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Jul 06, 2012
IBM and TEL NEXX Collaborate to Advance 3D Semiconductor
Packaging
Tokyo Electron Limited (TEL) today announced that TEL NEXX,
Inc. (TEL NEXX, a wholly-owned subsidiary of TEL) has reached
a new multi-year joint development program in 3D
semiconductor packaging with IBM. TEL NEXX has collaborated
with IBM R&D for many years (as NEXX Systems) to develop new
concepts for interposers, lead-free bumping, microbumps, and
other cutting-edge interconnect solutions. Now denser
packaging and more energy conscious requirements are pushing
semiconductor chip designs and equipment to deliver and
accommodate more functionality, as 3D structures become a
production reality. The program announced today focuses on
meeting IBM's rigorous technology requirements through its
partners in the Semiconductor Research and Development
Alliance. TEL NEXX will contribute its most advanced
production tools to the venture, including the Apollo for
physical vapor deposition (PVD), the Stratus for
electrochemical deposition (ECD), among others, to study both
complex substrates and tool design.
Tom Walsh, TEL NEXX President, commented "The challenges
offered through our collaboration with IBM, one of the most
distinguished technology innovators in the semiconductor
industry, keeps us innovating as a company. The opportunity
to work with IBM represents a chance to produce the world's
latest, greatest and most production focused technologies.
Enhanced Apollo PVD technology promises an economically
efficient solution for barrier seed deposition. Stratus ECD
will be deployed in developing plating interconnects, among
other 3D structures. We're aiming to meet levels of
productivity and reliability that solve problems only now
being formulated in IBM's advanced labs."
Last year, the Stratus plating platform for 300mm lead-free
packaging was qualified to serve the stringent reliability
requirements across IBM's product family, including high-end
and low-end servers and a wide range of custom logic
products. IBM's next generation server products are
challenged to demonstrate trouble-free lifetimes of up to
twenty years. Meeting that goal requires a near-perfect
processing environment provided by the PVD and ECD production
tools. The new IBM-TEL NEXX collaboration is squarely aimed
at unraveling and solving these types of challenges.
About TEL NEXX: TEL NEXX brings exceptional technical
expertise to flip chip and advanced packaging. Our product
lines provide the most efficient, yet affordable, systems of
their kind and include: Apollo for multi-layer sputter
deposition of metals, and Stratus for high throughput
electro-deposition of metals. Additional information can be
found at: www.nexxsystems.com.
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