Elmar Platzgummer
Chief Executive Officer at IMS Nanofabrication GmbH
Active connections
Name | Gender | Age | Linked companies | Collaboration |
---|---|---|---|---|
Hans Loeschner | M | - |
IMS Nanofabrication GmbH
IMS Nanofabrication GmbH SemiconductorsElectronic Technology IMS Nanofabrication AG develops lithography tools for the semiconductor and nanotech industries for the semiconductor and nanotech industry. The firm focuses on the development of an electron multi-beam Mask Exposure Tool (eMET) for the fabrication of masks and templates. The company was founded by Hans Loeschner and Ahmad Sarashgi in December 2006 and is headquartered in Vienna, Austria. | 39 years |
Karin Schuster | F | - |
IMS Nanofabrication GmbH
IMS Nanofabrication GmbH SemiconductorsElectronic Technology IMS Nanofabrication AG develops lithography tools for the semiconductor and nanotech industries for the semiconductor and nanotech industry. The firm focuses on the development of an electron multi-beam Mask Exposure Tool (eMET) for the fabrication of masks and templates. The company was founded by Hans Loeschner and Ahmad Sarashgi in December 2006 and is headquartered in Vienna, Austria. | 20 years |
Dan Chalom | M | - |
IMS Nanofabrication GmbH
IMS Nanofabrication GmbH SemiconductorsElectronic Technology IMS Nanofabrication AG develops lithography tools for the semiconductor and nanotech industries for the semiconductor and nanotech industry. The firm focuses on the development of an electron multi-beam Mask Exposure Tool (eMET) for the fabrication of masks and templates. The company was founded by Hans Loeschner and Ahmad Sarashgi in December 2006 and is headquartered in Vienna, Austria. | 11 years |
Walter H. Günzburgs | M | 65 |
University of Vienna
| 28 years |
Connections Chart
Multi-company connection
Former connections
Name | Gender | Age | Linked companies | Collaboration |
---|---|---|---|---|
Georg C. Reitboeck | M | - |
University of Vienna
| 5 years |
Stephan Dorfmeister | M | - |
IMS Nanofabrication GmbH
IMS Nanofabrication GmbH SemiconductorsElectronic Technology IMS Nanofabrication AG develops lithography tools for the semiconductor and nanotech industries for the semiconductor and nanotech industry. The firm focuses on the development of an electron multi-beam Mask Exposure Tool (eMET) for the fabrication of masks and templates. The company was founded by Hans Loeschner and Ahmad Sarashgi in December 2006 and is headquartered in Vienna, Austria. | - |
Wolfgang Baier | M | 50 |
University of Vienna
| 3 years |
Nikolaus Strohriegel | M | 55 |
University of Vienna
| 1 years |
Elisabeth Krainer Senger-Weiss | M | 52 |
University of Vienna
| 3 years |
Michael Höllerer | M | 46 |
University of Vienna
| 3 years |
Elke Maria Napokoj | M | - |
University of Vienna
| 3 years |
Ursula Wutte | M | - |
IMS Nanofabrication GmbH
IMS Nanofabrication GmbH SemiconductorsElectronic Technology IMS Nanofabrication AG develops lithography tools for the semiconductor and nanotech industries for the semiconductor and nanotech industry. The firm focuses on the development of an electron multi-beam Mask Exposure Tool (eMET) for the fabrication of masks and templates. The company was founded by Hans Loeschner and Ahmad Sarashgi in December 2006 and is headquartered in Vienna, Austria. | - |
Wolfgang Koberl | M | - |
University of Vienna
| 4 years |
Thomas Muchar | M | 50 |
University of Vienna
| 1 years |
Monika Wildner | M | 53 |
University of Vienna
| 4 years |
Hannes Moesenbacher | M | 52 |
University of Vienna
| 3 years |
Hanna Bomba | F | 46 |
University of Vienna
| 6 years |
Thomas Schmid | M | 48 |
University of Vienna
| 3 years |
Dávid Maász | M | 48 |
University of Vienna
| 4 years |
Veronika Janyrova | F | - |
University of Vienna
| 5 years |
Bernhard Tollay | M | - |
University of Vienna
| 4 years |
Dorothea Sztopko | F | - |
University of Vienna
| 6 years |
Sabine Mlnarsky-Bstandig | F | 49 |
University of Vienna
| 3 years |
Henriette Mark | F | 67 |
University of Vienna
| 2 years |
Hubert Zajicek | M | - |
University of Vienna
| 8 years |
Christoph Jeannée | M | - |
University of Vienna
| 3 years |
Frank Peter Averdung | M | - |
IMS Nanofabrication GmbH
IMS Nanofabrication GmbH SemiconductorsElectronic Technology IMS Nanofabrication AG develops lithography tools for the semiconductor and nanotech industries for the semiconductor and nanotech industry. The firm focuses on the development of an electron multi-beam Mask Exposure Tool (eMET) for the fabrication of masks and templates. The company was founded by Hans Loeschner and Ahmad Sarashgi in December 2006 and is headquartered in Vienna, Austria. | - |
Andrew McShea | M | - |
University of Vienna
| 3 years |
Stefan Riedler | M | 53 |
University of Vienna
| 3 years |
Judit Ágnes Havasi | M | 49 |
University of Vienna
| 3 years |
Günther Staffler | M | - |
University of Vienna
| 4 years |
Markus Braun | M | 54 |
University of Vienna
| 4 years |
Elisabeth Staudinger-Leibrecht | F | - |
University of Vienna
| 1 years |
Kurt Berger | M | 58 |
University of Vienna
| 3 years |
Veronika Haslinger | F | 52 |
University of Vienna
| 6 years |
Simon Weinberger | M | - |
University of Vienna
| 4 years |
Elisabeth Wagerer | F | 43 |
University of Vienna
| 11 years |
Christian Mezger | M | 55 |
University of Vienna
| 2 years |
Max Bayerl | M | - |
IMS Nanofabrication GmbH
IMS Nanofabrication GmbH SemiconductorsElectronic Technology IMS Nanofabrication AG develops lithography tools for the semiconductor and nanotech industries for the semiconductor and nanotech industry. The firm focuses on the development of an electron multi-beam Mask Exposure Tool (eMET) for the fabrication of masks and templates. The company was founded by Hans Loeschner and Ahmad Sarashgi in December 2006 and is headquartered in Vienna, Austria. | - |
Peter Hoesle | M | - |
IMS Nanofabrication GmbH
IMS Nanofabrication GmbH SemiconductorsElectronic Technology IMS Nanofabrication AG develops lithography tools for the semiconductor and nanotech industries for the semiconductor and nanotech industry. The firm focuses on the development of an electron multi-beam Mask Exposure Tool (eMET) for the fabrication of masks and templates. The company was founded by Hans Loeschner and Ahmad Sarashgi in December 2006 and is headquartered in Vienna, Austria. | 10 years |
Maximilian Pasquali | M | - |
University of Vienna
| 2 years |
Christian Mandl | M | - |
University of Vienna
| 13 years |
Statistics
Country | Connections | % of total |
---|---|---|
Austria | 42 | 100.00% |
Age of Connections
Active
Past
Male
Female
Members of the board
Executives
Origin of connections
- Stock Market
- Insiders
- Elmar Platzgummer
- Personal Network