JEOL : Introduces a Power-Efficient High-Throughput Spot Beam Lithography System, JBX-8100FS series
March 28, 2017 at 04:25 am EDT
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JEOL Ltd. (President Gon-emon Kurihara) announced a new spot beam lithography system, JBX-8100FS series, to be distributed in March 2017.
Product development background
Spot beam lithography system is a versatile technique for ultra fine pattern writing. Capable of accomplishing a minimum line width of a few nm to several tens nm, spot beam lithography is used in a wide range of applications from research to production. Problems with this technique, however, include low throughput as the feature sizes become smaller, and high running cost because it requires a large area for operation.
To address these problems, JEOL has developed the JBX-8100FS series, a compact, energy efficient electron beam lithography system designed to minimize the idle time in operation, especially during the exposure process, thus increasing throughput.
Main Features
Small footprint
The area required for the standard system is 4.9 m (W) x 3.7 m (D) x 2.6 m (H), much smaller than the conventional systems.
Low power consumption
Power needed for normal operation is approximately 3 kVA, reduced to 1/3 of the conventional systems.
High throughput
The system has two exposure modes, high resolution and high throughput modes, supporting different types of patterning from ultra fine processing to small to mid size production. It has minimized the idle time during exposure while increasing the maximum scanning speed by 1.25 to 2.5 times to 125 MHz (the world's highest level) for high speed writing.
Version
The JBX-8100FS is available in 2 versions: G1 (entry model) and G2 (full option model). Optional accessories can be added to the G1 model as needed.
New Functions
An optional optical microscope is available to enable examination of patterns on the sample without exposing resist to light. A signal tower is provided as standard for visual monitoring of system operation.
Laser positioning resolution
Stage positions are measured and controlled in 0.6 nm steps as standard, and in 0.15 nm steps with an optional upgrade.
System control
Versatile Linux® operating system combined with a new graphic user interface provides ease in operation. The data preparation program supports both Linux® and Windows®.
Notice:
Linux® is a registered trademark or trademark of Linus Torvalds in Japan and other countries.
Windows is a registered trademarks or trademark of Microsoft Corporation in the US and other countries.
±9 nm or less (high resolution mode)
±20 nm or less (high throughput mode)
Field stitching accuracy
±9 nm or less (high resolution mode)
±20 nm or less (high throughput mode)
Sample size
Wafers up to 200 mmφ, masks up to 6 inch, and micro sample pieces of any size
Link
JEOL Ltd.
JEOL is a world leader in electron optical equipment and instrumentation for high-end scientific and industrial research and development. Core product groups include electron microscopes (SEMs and TEMs), instruments for the semiconductor industry (electron beam lithography and a series of defect review and inspection tools), and analytical instruments including mass spectrometers, NMRs and ESRs.
For more information about JEOL Ltd. or any JEOL products, visit www.jeol.com.
Jeol Ltd. published this content on 28 March 2017 and is solely responsible for the information contained herein. Distributed by Public, unedited and unaltered, on 28 March 2017 08:25:11 UTC.
Original documenthttp://www.jeol.co.jp/en/news/detail/20170328.1810.html
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JEOL Ltd. is a Japan-based company mainly engaged in the manufacture, sale, maintenance, development and research of scientific instruments, semiconductor related equipment, industrial and medical equipment, and related products and parts. It operates through three business segments. Science and Measurement Equipment segment manufactures and sells three types of equipment. Electron optical devices include electron microscopes, peripheral devices and others. Analytical instruments include nuclear magnetic resonance equipment, electron spin resonance equipment and others. Measurement and inspection equipment include scanning electron microscopes, analytical scanning electron microscopes, peripheral equipment and others. Industrial Equipment segment manufactures and sells electron beam lithography equipment, linear electron guns and power supplies and others. Medical Equipment segment manufactures and sells clinical test information processing systems, and automatic amino acid analyzers.