Tokyo Electron Limited (TEL

TM

) announced today that it has begun accepting orders for the Impressio™ 1800 PICP. The Impressio 1800 PICP is a high resolution process version of the Impressio 1800 dry etch system for 6th generation glass substrates (1500 x 1850 mm) featuring the newly developed Planar Inductively Coupled Plasma (PICP) mode.

The Flat Panel Display (FPD) industry is pushing screen resolutions to the levels of 500, 600, and even 700 pixels per inch (ppi) for smartphones and similar devices, while also driving innovations in power saving and user interface technologies. As a result, dry etch systems for FPDs are now required to offer even more refined processing, higher productivity, and better yield than ever before. Responding to these demanding technology needs, TEL pursued an innovative concept and developed the PICP, the world's first plasma source for large FPD etch systems capable of producing extremely uniform high density plasma on the substrate. The PICP significantly improves the process uniformity and lowers power consumption by up to 20% or more (compared with previous TEL models), reducing the risk of electrostatic damage to devices and preventing process excursions in volume production.

The Impressio 1800 PICP has already been receiving favorable reviews from customers and is scheduled to become commercially available in or after January 2016.

'We've developed the Impressio 1800 PICP by building on our past achievements at customers' production lines and thinking extensively about meeting their essential needs,' said Tsuguhiko Matsuura, Vice President and General Manager, FPDBU at TEL. 'We are confident that the system will significantly boost productivity and improve the manufacturing yield of our customers' most advanced processes.'

TEL is committed to providing innovative technologies and effective solutions that satisfy market needs.

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