Applied DNA Sciences, Inc. announced the filing with the United States Patent and Trademark Office of two provisional patent applications claiming compositions of matter and methods to reduce or potentially eliminate double-stranded RNA (dsRNA) byproducts generated during the production of mRNA therapeutics. dsRNA is a widespread problematic impurity that can cause adverse reactions to mRNA therapies and is currently removed or mitigated using specialized purification instruments that reduce yields and increase manufacturing costs. The recently filed provisional patents are foundational to Applied DNA's recently launched Linea??

IVT platform that enables next-generation mRNA production by leveraging the unique attributes of the Company's PCR-based LinearDNATM platform resulting in a simplified mRNA production workflow with reduced dsRNA contamination. The Linea IVT platform combines cell-free, enzymatically produced linearDNA IVT templates with the Company's proprietary Linea?? RNA polymerase to deliver multiple advantages over conventional mRNA production, including: 1) the elimination of plasmid DNA as a starting material; 2) the prevention or reduction of dsRNA contamination resulting in higher target mRNA yields; and, 3) the delivery of IVT templates in as little as 14 days for milligram scale and 30 days for gram scale.