centrotherm announced that it is presenting its powerful new production solutions for the manufacturing of power semiconductors to an international audience. A drive-in process at 1350 -C was developed for centrotherm's c.HORICOO 200 horizontal furnace. This process doubles the throughput of silicon wafers, while cutting process time by 50 percent. To this end, an innovative heating concept was implemented in the horizontal furnaces. The reliability and efficiency of the process were already demonstrated in mass production. With the c.HORICOO 300, centrotherm is entering the field for the mass production of 300 mm silicon wafers. The equipment-cluster features more than eight process tubes fully automatically loaded by a robot, which significantly increases wafer throughput. As all centrotherm horizontal furnaces, the powerful c.HORICOO 300 is compelling with its excellent temperature uniformity and process stability so highly prized by customers in the semiconductor industry. A space-saving side-by-side installation of the cluster ensures optimal use of the cleanroom and thus low cost-of-ownership.