NuFlare Technology, Inc. and NGR Inc. announced the companies are jointly collaborating on a development program for the Next-Generation Electron-Beam Wafer Inspection and Metrology System. NFT has been active in the development, manufacture, and sale of electron-beam mask writers, mask inspection systems, and epitaxial growth systems, equipment all essential in the drive toward shrinking physical dimensions and growing sophistication of semiconductor devices. Especially electron beam mask writers with their nanometer precision machine and control technologies, teraflops speed and high-capacity information processing features, and mask inspection systems with their high-speed inspection technology, 199nm light source, and sophisticated mask inspection applications are widely recognized among the mask manufacturing customers.NFT and NGR joint development program is focused on Next-Generation Electron-Beam Wafer Inspection and Metrology System targeted for sub-10nm devices based on Electron-Beam, Mask Inspection and Wafer Inspection & Metrology technologies.